International Symposium on Fluorous Technologies 2011 (ISoFT'11)Activity by Istvan T. Horvath | added on Dec 16, 2010 | Hong Kong
Sponsor(s): Department of Biology and Chemistry, City University of Hong Kong
ISoFT'11 will be held in Hong Kong between 30 November and 3 December 2011 and focus on the latest developments of fluorous chemistry and technology.
Building on the great success of the past International Symposiums on Fluorous Technologies since 2005, the fourth International Symposium on Fluorous Technologies 2011 (ISoFT’11) will be held at the City University of Hong Kong, Hong Kong, from Wednesday evening on November 30 to Saturday noon, December 3, 2011. The Symposium will consist of plenary and invited lectures, oral and poster presentations by participants. All lectures will be presented in a single-session format. ISoFT'11 will focus on Structural, Physical, and Chemical Properties of Fluorous Compounds, Computational Fluorous Chemistry, Chemical and Biological Applications of Fluorous Reagents and Catalysts, Fluorous Materials, and Environmental Aspects of Fluorous Chemistry.
Veronique Gouverneur, Oxford University, United Kingdom
Kenichi Hatanaka, University of Tokyo, Japan
Jinbo Hu, Shanghai Institute of Organic Chemistry, China
Wei Zhang, University of Massachusetts Boston, USA
Chun Cai, Nanjing University of Science and Technology, China
Masahiro Goto, Kyushu University, Japan
Santos Fustero, Universidad de Valencia, Spain
Scott A. Mabury, University of Toronto, Canada